Direct Laser Writing of Ferromagnetic Nickel Utilizing the Principle of Sensitized Triplet-Triplet Annihilation Upconversion
This paper presents a novel photoresist utilizing sensitized triplet-triplet annihilation upconversion combined with in-situ photochemical deoxygenation and Ni2+ photoreduction to enable the direct laser writing of ferromagnetic nickel microstructures under ambient conditions.
Kristin E. J. Kühl (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Katharina Rediger (Department of Chemistry, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Nikhita Khera (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Ephraim Spindler (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Gereon Niedner-Schatteburg (Department of Chemistry, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Elke Neu (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Mathias Weiler (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany), Georg von Freymann (Department of Physics and Research Center OPTIMAS, RPTU University Kaiserslautern-Landau, Kaiserslautern, Germany, Fraunhofer Institute for Industrial Mathematics ITWM, Kaiserslautern, Germany)Wed, 11 Ma🔬 cond-mat.mtrl-sci