Understanding the anomalous thermoelectric behaviour of Fe-V-W-Al based thin films
Fe-V-W-Al thin films deposited at higher base pressures on n-Si substrates exhibit an anomalous amorphous structure that yields exceptionally high thermoelectric performance, including a Seebeck coefficient of ~1098 μV/K and a figure of merit of ~3.9 near 320 K, significantly surpassing previously reported values for thin films.